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Production of optically transparent regions in a silicon substrate used for optical investigations of small amounts of liquid in medicine and analysis comprises etching and oxidizing the defined transparent regions in the substrate
Production of optically transparent regions in a silicon substrate used for optical investigations of small amounts of liquid in medicine and analysis comprises etching and oxidizing the defined transparent regions in the substrate
Production of optically transparent regions (5, 6) in a silicon substrate (1) comprises etching the defined transparent regions in the substrate; and oxidizing the regions. An Independent claim is also included for the structure produced. Preferred Features: The defined transparent regions are etched using electrochemical etching, especially electrochemical anodizing. The etching solution used is a medium containing hydrofluoric acid, preferably an aqueous hydrofluoric acid solution or a hydrofluoric acid mixture containing an alcohol and/or a wetting agent.
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