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IN-SITU METALIZATION MONITORING USING EDDY CURRENT MEASUREMENTS AND OPTICAL MEASUREMENTS
IN-SITU METALIZATION MONITORING USING EDDY CURRENT MEASUREMENTS AND OPTICAL MEASUREMENTS
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机译：利用涡流测量和光学测量进行原位金属化监测
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摘要
It is used the invention discloses a kind of acquisition in situ about film sample and removes film during eddy current probes technique. The eddy current probes have at least one induction coil. Alternating voltage is applied to the eddy current probes of induction coil (one or more). (one or more) eddy current probes of one or more first signal measure in sensor coils are located in induction coil (one or more) close to film sample. (one or more) eddy current probes of one or more second signal measure in sensor coils, which are positioned adjacent to reference material in induction coil (one or more), has fixed ingredient and/or from induction coil. Undesired gain and/or phase change of first signal calibration based on second signal, so that in the correction of the first signal. The attribute value that a kind of film determines is the first signal based on calibration. One kind is also disclosed for executing the above method. It is disclosed in addition, chemically mechanical polishing (CMP) system polishes sample monitoring sample with polishing agent. The CMP system includes on polishing block, and carrier is arranged to keep the sample in polishing block and eddy current probes.
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