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X-ray analysis device with X-ray optical semi-conductor construction element
X-ray analysis device with X-ray optical semi-conductor construction element
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机译：具有X射线光学半导体构造元件的X射线分析装置
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摘要
An X-ray analysis device (1) having an X-ray source (2) for illuminating a sample (6) with X-radiation (4), a sample support for receiving the sample (6) and a detector (12,14) for detecting the diffracted or scattered X-radiation or fluorescent X-radiation (4) emitted by the sample, wherein an X-ray optical construction element of semi-conductor material having a plurality of channels which are essentially transparent to X-radiation (4,4) is provided in the path of rays between the X-ray source (2) and the detector (12,14), is characterized in that the X-ray optical construction element comprises a semi-conductor wafer (20;30a;30b;40;50) into which micropores (21;31;41) are etched which extend essentially in parallel in the direction of the rays and have diameters of 0.1 to 100 m, preferably 0.5 and 20 m. Such X-ray optical construction elements are, on the one hand, not poisonous, and on the other hand particularly transparent for X-rays, wherein a relatively high mechanical rigidity can be achieved also with large openings and very short construction lengths and thus also a particularly long service life and high pressure stability and density.
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