首页> 外国专利> METHOD FOR MANUFACTURING LIQUID CRYSTAL SUBSTRATE, LIQUID CRYSTAL SUBSTRATE, SUBSTRATE FOR LIQUID CRYSTAL DEVICE AND LIQUID CRYSTAL DEVICE

METHOD FOR MANUFACTURING LIQUID CRYSTAL SUBSTRATE, LIQUID CRYSTAL SUBSTRATE, SUBSTRATE FOR LIQUID CRYSTAL DEVICE AND LIQUID CRYSTAL DEVICE

机译:液体结晶基质,液体结晶基质,液体结晶器件基质和液体结晶器件的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing liquid crystal substrate causing no alignment defect and to provide a liquid crystal substrate, a substrate for liquid crystal device, and a liquid crystal device.;SOLUTION: A mother TFT array substrate 300 has an effective region in which a plurality of substrates 10 for the liquid crystal device are arranged and a non-effective region which is not used as the substrates 10 for the liquid crystal device. A TEG Test Element Group 302 is provided in the non-effective region. A TEG 301 is provided in such a manner that an extended region 302 formed by extending the TEG 301 toward a rubbing terminating part along a rubbing direction in a rubbing treatment of the mother TFT array substrate 300 is in the non-effective region.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:提供一种不产生取向缺陷的液晶基板的制造方法,并提供液晶基板,液晶装置用基板和液晶装置。有效区域中配置有多个用于液晶装置的基板10,以及无效区域,该无效区域未被用作液晶装置的基板10。在无效区域中提供了TEG测试元件组302。提供TEG 301,使得通过在母TFT阵列基板300的摩擦处理中沿着摩擦方向朝向摩擦终止部分延伸TEG 301而形成的延伸区域302处于无效区域中。 :(C)2001,日本特许厅

著录项

  • 公开/公告号JP2001337344A

    专利类型

  • 公开/公告日2001-12-07

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20000156654

  • 发明设计人 KOIDE SEIKI;

    申请日2000-05-26

  • 分类号G02F1/1368;G02F1/13;G02F1/1333;G02F1/1337;G09F9/30;

  • 国家 JP

  • 入库时间 2022-08-22 00:53:17

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