首页> 外国专利> ORIGINAL MOLD OF INTAGLIO FOR THICK FILM PATTERN TRANSFER, METHOD FOR MANUFACTURING THE SAME, INTAGLIO FOR THICK FILM PATTERN TRANSFER, METHOD FOR MANUFACTURING THE SAME, METHOD FOR MANUFACTURING THICK FILM PATTERN, BACK SURFACE SUBSTRATE OF PLASMA DISPLAY, METHOD FOR MANUFACTURING THE SAME, PLASMA DISPLAY AND METHOD FOR MANUFACTURING THE SAME

ORIGINAL MOLD OF INTAGLIO FOR THICK FILM PATTERN TRANSFER, METHOD FOR MANUFACTURING THE SAME, INTAGLIO FOR THICK FILM PATTERN TRANSFER, METHOD FOR MANUFACTURING THE SAME, METHOD FOR MANUFACTURING THICK FILM PATTERN, BACK SURFACE SUBSTRATE OF PLASMA DISPLAY, METHOD FOR MANUFACTURING THE SAME, PLASMA DISPLAY AND METHOD FOR MANUFACTURING THE SAME

机译：厚膜图案转印的原版模具，制造相同方法的方法，厚膜图案转印的原版模具，制造相同方法，制造厚膜图案的方法，等离子显示器的背面材料，等离子体显示的方法，相同的制造方法显示器及其制造方法

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PROBLEM TO BE SOLVED: To provide a letterpress becoming the original mold of an intaglio for forming a thick film pattern and holding high detailedness, a high aspect ratio, high positional accuracy and strength.;SOLUTION: The letterpress for forming the thick film pattern consists of a substrate and a pattern due to a photosensitive resist. In order to impart sufficient strength to the letterpress, an intermediate layer and a surface coating layer formed by using a metal or a metal oxide are arranged between the substrate and the photosensitive resist pattern, and a resin layer is arranged to the side surface and bottom part of the letterpress.;COPYRIGHT: (C)2002,JPO

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公开/公告号JP2002046249A

专利类型
公开/公告日2002-02-12

原文格式PDF
申请/专利权人 TOPPAN PRINTING CO LTD;
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申请/专利号JP20010129001
发明设计人 ONO NAOTO;KATO ISAO;MAEHARA MASATAKA;NAKAMURA RYUICHI;
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申请日2001-04-26
分类号B41C3/06;G03F7/095;G03F7/11;G03F7/40;H01J9/02;H01J11/02;
国家 JP
入库时间 2022-08-22 00:58:24

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