首页> 外国专利> Adaptive mask engineering for inspecting defects uses an algorithm to generate a two-dimensional scatter diagram by plotting grey grades of pixels from a test image in contrast to grey grades of pixels from a reference image.

Adaptive mask engineering for inspecting defects uses an algorithm to generate a two-dimensional scatter diagram by plotting grey grades of pixels from a test image in contrast to grey grades of pixels from a reference image.

机译:用于检查缺陷的自适应蒙版工程使用一种算法,通过绘制测试图像中像素的灰度等级与参考图像中像素的灰度等级相对比来生成二维散布图。

摘要

A two-dimensional scatter diagram is generated by plotting grey grades of pixels from a test image in contrast to grey grades of corresponding pixels from a reference image. A noise suppression filter is applied to the scatter diagram in order to define a mask form that can be deduced and completed to form a mask. Defect pixels are identified in the test image and corresponding pixel grey values are compared with the mask.
机译:通过绘制测试图像中像素的灰度等级与参考图像中相应像素的灰度等级形成对比,可以生成二维散点图。噪声抑制滤波器应用于散布图,以便定义可以推导并完成以形成掩模的掩模形式。在测试图像中识别出缺陷像素,并将相应的像素灰度值与蒙版进行比较。

著录项

  • 公开/公告号DE10037697A1

    专利类型

  • 公开/公告日2001-03-15

    原文格式PDF

  • 申请/专利权人 SCHLUMBERGER TECHNOLOGIES INC. SAN JOSE;

    申请/专利号DE2000137697

  • 发明设计人 AGHAJAN HAMID K.;

    申请日2000-08-02

  • 分类号G01N21/88;G06T5/50;H01L21/66;

  • 国家 DE

  • 入库时间 2022-08-22 01:09:42

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