首页> 外国专利> Flux transfer apparatus for wafer, has drive unit which is controlled to rotate transfer pin within horizontal surface during flux transfer

Flux transfer apparatus for wafer, has drive unit which is controlled to rotate transfer pin within horizontal surface during flux transfer

机译：用于晶片的焊剂输送设备，具有驱动单元，该驱动单元在焊剂输送期间被控制为在水平表面内旋转输送销。

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摘要

A transfer pin (2) has flux adhered to one end. A drive unit performs vertical movement of transfer pin in horizontal surface. A control unit controls drive unit to make transfer pin rotate within the horizontal surface during flux transfer. An Independent claim is also included for flux transfer procedure.

机译：传输销（2）的一端粘有助焊剂。驱动单元在水平面上执行转移销的垂直运动。控制单元控制驱动单元，以在磁通量传递期间使传递销在水平面内旋转。磁通量传递过程还包括独立索赔。

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公开/公告号DE10034840A1

专利类型
公开/公告日2001-03-08

原文格式PDF
申请/专利权人 SHIBUYA KOGYO CO. LTD.;
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申请/专利号DE2000134840
发明设计人 HASHIBA NAOHIRO;NIIZUMA KAZUO;
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申请日2000-07-18
分类号B23K1/20;H01L21/60;
国家 DE
入库时间 2022-08-22 01:09:43

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