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/ RESISTIVE HEATING OF POWER COIL TO REDUCE TRANSIENT HEATING/START UP EFFECTS
/ RESISTIVE HEATING OF POWER COIL TO REDUCE TRANSIENT HEATING/START UP EFFECTS
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机译：/电阻线圈的电阻加热，以减少瞬态加热/启动的影响
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摘要
The method for pre-heating a coil used to generate a plasma field in a process chamber of a semiconductor manufacturing system and apparatus. Prior to sputter depositing the material onto the substrate and the material to preheat the coil in the chamber. Coil is preheated to a temperature equal to the equilibrium reached by the coil during the sputter deposition process, or that at least it is desired predetermined temperature. Or it preheated with a preheating current of a frequency that is lower than the minimum frequency necessary for the combustion plasma, if the process chamber the pressure that is formed in the plasma suppression, may be the warm-up coil for a predetermined time.
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