recovery of the damage of the oxide field caused by ion implantation at high energy and manufacturing processes

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• 2. 氧化铈纳米颗粒在制备治疗多种诱因引起的脓毒血症损伤的药物中的应用 [P] . 中国专利： CN113577100A . 2021-11-02
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  机译： 恢复由高能离子注入工艺和程序引起的氧化场损伤

• 4. Recovery of damages in a field oxide caused by high energy ion implant process [P] . 美国专利： US6225231B1 . 2001-05-01

  机译： 恢复由高能离子注入过程引起的场氧化物损伤

• 5. METHOD FOR REDUCING DAMAGE TO AND LESIONS OF SURFACES IN THE PROPAGATION FIELD OF HIGH-ENERGY PRESSURE WAVES, USING AN AGENT FOR REDUCING BUBBLE FORMATION CAUSED BY THE PRESSURE WAVES, AND PRESSURE WAVE GENERATING DEVICE FOR IMPLEMENTING SAID METHOD [P] . 欧洲知识产权局专利： EP0610434A1 . 1994-08-17

  机译： 一种用于减少由压力波引起的气泡形成的代理商以及一种用于实现上述方法的减小压力波产生装置的减少高能压力波传播领域中的表面损伤和缺陷的方法

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