首页> 外国专利> MEASUREMENT METHOD AND CORRECTION METHOD OF THE DEVIATION OF ELECTRON BEAM SCANNING AXIS WITH STAGE MOVING AXIS AND STAGE MOVING ERROR IN SCANNING ELECTRON MICROSCOPE

MEASUREMENT METHOD AND CORRECTION METHOD OF THE DEVIATION OF ELECTRON BEAM SCANNING AXIS WITH STAGE MOVING AXIS AND STAGE MOVING ERROR IN SCANNING ELECTRON MICROSCOPE

机译:电子束扫描轴与级动轴的偏离的测量方法和校正方法以及扫描电子显微镜中级动误差

摘要

PROBLEM TO BE SOLVED: To measure the deviation of an electron beam scanning axis with a stage moving axis of a scanning electron microscope.;SOLUTION: An arithmetic circuitry 17 for a picture error amount finds the error in the X-axis direction and the Y-axis direction of two-sheet pictures, an arithmetic circuitry 18 for a movement error finds the error of the state movement amount and an arithmetic circuitry 19 for a rotation error amount finds the errors in the X-axis and the Y-axis of the stage and the rotation direction in the X-axis and the Y-axis of electron beam, based on the picture data obtained before and after the movement of the stage.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:测量电子束扫描轴与扫描电子显微镜的载物台移动轴之间的偏差。解决方案:图像误差量的算术电路17在X轴方向和Y轴上求出误差在两张图片的轴方向上,用于运动误差的算术电路18发现状态运动量的误差,而用于旋转误差量的算术电路19发现状态误差的X轴和Y轴的误差。平台和平台在移动之前和之后获得的图像数据为依据,以及电子束在X轴和Y轴上的旋转方向。;版权:(C)2001,JPO

著录项

  • 公开/公告号JP2001155674A

    专利类型

  • 公开/公告日2001-06-08

    原文格式PDF

  • 申请/专利权人 JEOL LTD;NIPPON DENSHI ENG KK;

    申请/专利号JP19990340570

  • 发明设计人 KATAUE MASUMI;KANAYAMA MIYUKI;

    申请日1999-11-30

  • 分类号H01J37/22;

  • 国家 JP

  • 入库时间 2022-08-22 01:27:03

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