首页> 外国专利> The tip/chip for electron beam spot form measurement and the electron beam spot form measuring method null which uses this

The tip/chip for electron beam spot form measurement and the electron beam spot form measuring method null which uses this

机译:电子束斑形测量的尖端/芯片和使用该方法的电子束斑形测量方法无效

摘要

PURPOSE: To provide a chip for measuring the shape of an electron beam spot in which highly efficient alignment is realized between dots and the electron beam spot. ;CONSTITUTION: The chip 20 for measuring the shape of an electron beam spot has a pattern 23 for measuring the shape of the electron beam spot formed on an Si chip substrate 21. The measuring pattern 23 comprises a grid pattern formed by X-direction lines 26-1-26-4 and Y-direction lines 27-1-27-4 made of Ta, and dots 28-1-28-9 in each grid made of Ta. The dots 28-1-28-9 are located at predetermined positions with respect to the lines 26-1-26-4, 27-1-27-4. Each line 26-1-26-4, 27-1-27-4 is constituted to function as a reference position when the dots 28-1-28-9 are searched.;COPYRIGHT: (C)1994,JPO&Japio
机译:目的:提供一种用于测量电子束斑形状的芯片,其中在点和电子束斑之间实现了高效的对准。 ;组成:用于测量电子束点的形状的芯片20具有用于测量形成在Si芯片基板21上的电子束点的形状的图案23。测量图案23包括由X方向线形成的栅格图案。由Ta制成的26-1-26-4和Y方向线27-1-27-4,以及由Ta制成的每个网格中的点28-1-28-9。点28-1-28-9相对于线26-1-26-4、27-1-27-4位于预定位置。每行26-1-26-4、27-1-27-4构成为在搜索点28-1-28-9时用作参考位置。版权所有:(C)1994,JPO&Japio

著录项

  • 公开/公告号JP3168072B2

    专利类型

  • 公开/公告日2001-05-21

    原文格式PDF

  • 申请/专利权人 富士通株式会社;

    申请/专利号JP19920220365

  • 发明设计人 高橋 靖;柴田 真理;

    申请日1992-08-19

  • 分类号H01L21/027;G03F7/20;

  • 国家 JP

  • 入库时间 2022-08-22 01:34:03

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