首页> 外国专利> High surface area texturing of a substrate, especially to producing a miniature planar analysis device for liquid phase analysis, comprises material removal and-or addition

High surface area texturing of a substrate, especially to producing a miniature planar analysis device for liquid phase analysis, comprises material removal and-or addition

机译:基材的高表面积纹理化,特别是用于生产用于液相分析的微型平面分析设备,包括材料去除和/或添加

摘要

Substrate surface texturing, by material removal and/or addition to form a high surface area texturing, is new. Independent claims are also included for the following: (1) a high surface area textured substrate produced by the novel process; (2) a miniature analysis device produced by the novel process; and (3) production of a duplicated copy of a high surface area textured substrate using the substrate of (1) or the device of (2) as the original.
机译:通过材料去除和/或添加以形成高表面积纹理化,对衬底表面进行纹理化是新的。还包括以下方面的独立权利要求:(1)通过新方法生产的高表面积纹理化基材; (2)通过新方法生产的微型分析装置; (3)使用(1)的基底或(2)的装置作为原始物来生产高表面积纹理化基底的副本。

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