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Refractive reduction projection objective, used in a projection exposure unit for microlithography, includes quartz glass lenses with a negative sum of refractive indices
Refractive reduction projection objective, used in a projection exposure unit for microlithography, includes quartz glass lenses with a negative sum of refractive indices
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机译：缩微投影物镜，用于微光刻的投影曝光设备中，包括石英玻璃透镜，其折射率之和为负
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摘要
Refractive reduction projection objective includes quartz glass lenses with a negative sum of refractive indices. A refractive reduction projection objective, for microlithography, has quartz glass lenses and fluoride lenses, the sum of the refractive indices of the quartz glass lenses being negative and preferably only negative refractive index quartz glass lenses (18, 23, 26) being used. Independent claims are also included for the following: (i) a reduction projection objective for microlithography with an operating wavelength of less than 200 (preferably 193 or 157) nm and with CaF2 lenses (1-17, 19, 20, 22, 27-35), other fluoride crystal lenses (21, 24, 25) and one or more quartz glass lenses (18, 23, 26); (ii) catadioptric reduction objectives as described above; (iii) a projection exposure unit for microlithography, including one of the above objectives; and (iv) microlithographic processing of an object using the above projection exposure unit.
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