首页> 外国专利> Vertical IC, e.g. a vertical integrated CMOS circuit, comprises a chip stack with a via which electrically connects metallizations of spaced-apart chips and which is insulated from an intermediate chip

Vertical IC, e.g. a vertical integrated CMOS circuit, comprises a chip stack with a via which electrically connects metallizations of spaced-apart chips and which is insulated from an intermediate chip

机译:垂直IC,例如垂直集成CMOS电路,包括具有通孔的芯片堆叠,该通孔电连接间隔开的芯片的金属化层,并且与中间芯片绝缘

摘要

A vertical IC, comprising a chip stack (30) with a via (25b) which electrically connects metallizations (4, 21) of spaced-apart chips (2, 19) and which is insulated from an intermediate chip (8), is new. A vertical IC comprises (a) a stack (30) of first, second and third circuit chips (2, 8, 19), each having a circuit structure (3, 9, 20) and a metallization structure (4, 10, 21); and (b) a via (25b) which extends between and electrically connects the first chip and third chip metallization structures (4, 21) and which is electrically insulated from the second chip (8). An Independent claim is also included for production of the above vertical IC.
机译:新型的垂直集成电路是新的,该集成电路包括带有通孔(25b)的芯片堆叠(30),该通孔(25b)电连接间隔开的芯片(2、19)的金属层(4、21),并且与中间芯片(8)绝缘。垂直IC包括:(a)第一,第二和第三电路芯片(2、8、19)的堆叠(30),每个电路芯片具有电路结构(3、9、20)和金属化结构(4、10、21) ); (b)通孔(25b),其在第一芯片和第三芯片金属化结构(4、21)之间延伸并电连接,并且与第二芯片(8)电绝缘。对于上述垂直IC的生产也包括独立索赔。

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