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Plasma generation method for generating impervious/dense plasmas in vacuum processes, includes applying direct current between hollow cathode, its ring anode where discharge current follows constantly to set up impervious/dense plasma
Plasma generation method for generating impervious/dense plasmas in vacuum processes, includes applying direct current between hollow cathode, its ring anode where discharge current follows constantly to set up impervious/dense plasma
A direct current is applied between the hollow cathode (1) and its ring anode (2) where a discharge current follows constantly. Independent of the polarity of the pulse generator (4) interrupted a plasma (6) and the electron emission of the hollow cathode burns constantly. In the phase of the positive polarity at anode (3), the impervious/dense plasma (7) is set up. For pulse frequencies above 1000 Hz, plasma (7) remains stable and no longer becomes influenced of the phase position of the output voltage of the pulse generator. An Independent claim is also included for a device for practicing the method, includes a hollow cathode (1), a circular auxiliary anode (2) arranged immediately in front of the hollow cathode and an anode (3), a pulse generator (4) between the hollow cathode and the anode is connected, and a direct current voltage source (5) is connected.
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