首页> 外国专利> Vacuum deposition apparatus used for coating films by condensation of the metal vapor has a gas lance for guiding a cooling gas stream against the film arranged in the winding chamber approximately over the width of the film

Vacuum deposition apparatus used for coating films by condensation of the metal vapor has a gas lance for guiding a cooling gas stream against the film arranged in the winding chamber approximately over the width of the film

机译:用于通过金属蒸气的冷凝来涂覆膜的真空沉积设备具有气体喷枪,该气体喷枪用于将冷却气流引导至布置在卷绕室中的膜上大约在膜的整个宽度上

摘要

A gas lance (15) for guiding a cooling gas stream against the film is arranged in the winding chamber approximately over the width of the film. Vacuum deposition apparatus comprises a roller (10) with a partial region of its sleeve surface inserted in a winding chamber (4) held under vacuum and a vacuum deposition chamber (3). A film (9) to be coated is lead out of the winding chamber along a partial region of the sleeve surface of the roller through the deposition chamber and back to the winding chamber. A gas lance (15) for guiding a cooling gas stream against the film is arranged in the winding chamber approximately over the width of the film. An Independent claim is also included for a process for the coating a film using the above vacuum deposition apparatus.
机译:在卷绕室中大致在膜的整个宽度上布置有用于将冷却气流引导向膜的气枪(15)。真空沉积设备包括辊(10)和真空沉积室(3),该辊的套筒表面的部分区域插入保持在真空下的卷绕室(4)中。将要涂覆的薄膜(9)沿着辊子的套筒表面的部分区域从沉积室中引出,穿过沉积室并返回到缠绕室中。在卷绕室中大致在膜的整个宽度上布置有用于将冷却气流引导向膜的气枪(15)。还包括使用上述真空沉积设备涂覆膜的方法的独立权利要求。

著录项

  • 公开/公告号DE19853418A1

    专利类型

  • 公开/公告日2000-05-25

    原文格式PDF

  • 申请/专利权人 LEYBOLD SYSTEMS GMBH;

    申请/专利号DE1998153418

  • 申请日1998-11-19

  • 分类号C23C14/56;C23C14/22;

  • 国家 DE

  • 入库时间 2022-08-22 01:42:27

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