首页> 外国专利> NON VOLATILE SINGLE ELECTRON TRANSISTOR MEMORY USING QUANTUM DOT AND METHOD THEREOF, AND SINGLE ELECTRON TRANSISTOR USING QUANTUM DOT AND METHOD THEREOF

NON VOLATILE SINGLE ELECTRON TRANSISTOR MEMORY USING QUANTUM DOT AND METHOD THEREOF, AND SINGLE ELECTRON TRANSISTOR USING QUANTUM DOT AND METHOD THEREOF

机译:使用量子点的非挥发性单电子晶体管存储器及其方法,以及使用量子点的非挥发性电子晶体管及其方法

摘要

PURPOSE: A non volatile single electron transistor memory is provided to secure a repeatability and a uniformity of an island by using a quantum dot for precisely controlling the size of the island to a unit of nanometer. CONSTITUTION: A non volatile single electron transistor memory comprises a silicon substrate(100), quantum dots(110) of a predetermined size, a source(120) and a drain(130), and a side gate. A SiO2 oxidation layer(100b) is formed on the silicon substrate. The quantum dots of a predetermined size are separated a predetermined interval from each other on the SiO2 oxidation layer. The source and drain are formed by evaporating a metal on the SiO2 oxidation layer including the quantum dots, having a predetermined number of the quantum dots used as an island, between the source and the drain. The side gate is formed on the SiO2 oxidation layer at a side surface of the source and drain, having a predetermined interval from the source and drain.
机译:目的:提供一种非易失性单电子晶体管存储器,通过使用量子点将岛的尺寸精确控制到纳米单位,以确保岛的可重复性和均匀性。组成:一种非易失性单电子晶体管存储器,包括硅衬底(100),预定大小的量子点(110),源极(120)和漏极(130)以及侧栅极。在硅衬底上形成SiO 2氧化层(100b)。预定尺寸的量子点在SiO 2氧化层上彼此隔开预定间隔。通过在包括量子点的SiO 2氧化层上蒸发金属来形成源极和漏极,其中该量子点在源极和漏极之间具有预定数量的用作岛的量子点。侧栅形成在源极和漏极的侧面处的SiO 2氧化层上,与源极和漏极具有预定间隔。

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