首页> 外国专利> Apparatus for deposition by steam quìmico to deposso deposition by steam quìmico.

Apparatus for deposition by steam quìmico to deposso deposition by steam quìmico.

机译:用于通过蒸汽定量沉积以通过蒸汽定量沉积的设备。

摘要

An improved procedure for chemical vapor deposition are presented.The technique provides better protection of the reaction zones and deposition where coatings can be produced in atmospheric pressure.Materials that are sensitive to components in the atmosphere on substrates that are email, or inconvenient, to process in vacuum chambers or the like.The technique developed can be used with various energy sources and is particularly compatible with the techniques of deposition by chemical vapor combustion (CCVD).
机译:提出了一种改进的化学气相沉积程序,该技术可以更好地保护反应区和沉积,从而可以在大气压下生产涂层。对电子邮件中或处理不便的基材上的大气成分敏感的材料所开发的技术可以与各种能源一起使用,并且特别适合于通过化学气相燃烧(CCVD)进行沉积的技术。

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