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PATTERN FOR EXAMINATION AND EXAMINATION METHOD THEREFOR
PATTERN FOR EXAMINATION AND EXAMINATION METHOD THEREFOR
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机译：考试模式及考试方法
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摘要
PROBLEM TO BE SOLVED: To easily detect defects such as short circuitting of a contact hole for making a semiconductor substrate conduct with other wiring, with a conductive pattern which originally is not conducted. SOLUTION: A pattern for examination formed on a silicon substrate 21 is provided with a first contact line composed of plural polysilicon wiring layers 104 insulated from the silicon substrate 21 and plural contact holes 101 arranged, corresponding to the polysilicon wiring layers 104, conducted to the silicon substrate 21 and insulated from the polysilicon wiring layers 104 via a sidewall 24 and a second contact line composed of plural contact hole 102 arranged corresponding to the polysilicone wiring layers 104 and respectively conducted to the respective correspondent polysilicon wiring layers 104.
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