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Phase shifting mask having a phase shift that minimizes critical dimension sensitivity to manufacturing and process variance
Phase shifting mask having a phase shift that minimizes critical dimension sensitivity to manufacturing and process variance
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机译：具有相移的相移掩膜可将对制造和工艺差异的关键尺寸敏感性降至最低
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摘要
A reticle having only one phase delay value for a given wavelength of incident radiation. The reticle includes a first and second region, both transparent to incident radiation. The second region being adjacent to said first region. The incident radiation transmitted by the second region has a phase delay of other than an integer multiple of 90 degrees relative to said incident radiation transmitted by the first region.
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