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首页> 外国专利> In - situ - control technique and apparatus for determining the end of a chemically - mechanical coal charging

In - situ - control technique and apparatus for determining the end of a chemically - mechanical coal charging

机译：确定化学机械装煤终点的原位控制技术和装置。

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摘要

An in-situ chemical-mechanical polishing process monitor apparatus for monitoring a polishing process during polishing of a workpiece in a polishing machine, the polishing machine having a rotatable polishing table provided with a polishing slurry, is disclosed. The apparatus comprises a window embedded within the polishing table, whereby the window traverses a viewing path during polishing and further enables in- situ viewing of a polishing surface of the workpiece from an underside of the polishing table during polishing as the window traverses a detection region along the viewing path. A reflectance measurement means is coupled to the window on the underside of the polishing table for measuring a reflectance, the reflectance measurement means providing a reflectance signal representative of an in-situ reflectance, wherein a prescribed change in the in-situ reflectance corresponds to a prescribed condition of the polishing process.
机译：本发明公开了一种用于在抛光机中监测工件抛光过程中的抛光过程的原位化学机械抛光过程监控装置，该抛光机具有可旋转的抛光台，该抛光台设有抛光浆。该设备包括嵌入在抛光台内的窗口，由此该窗口在抛光期间横穿观察路径，并且当窗口横穿检测区域时，还使得能够在抛光期间从抛光台的下面就地观察工件的抛光表面。沿着观看路径。反射率测量装置耦合到抛光台的下侧上的窗口以测量反射率，该反射率测量装置提供代表原位反射率的反射率信号，其中原位反射率的规定变化对应于抛光过程的规定条件。

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