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How to plate palladium or palladium alloy on iron-nickel alloy material

机译:如何在铁镍合金材料上镀钯或钯合金

摘要

A method of palladium plating and palladium alloy plating on a semiconductor lead frame made of an iron-nickel alloy material is disclosed. The method includes a copper plating layer, a nickel tin alloy plating layer, or a copper tin alloy plating layer on a plated body of an iron-nickel alloy material. It is characterized in that the primary base plated to form, and the secondary base plated to form a nickel plated layer, gold alloy plated layer thereon and then palladium plated or palladium alloy plated, except that when the primary base plated layer is a copper plating layer, the secondary base plated layer is gold Alloy plating layer. Since the three-stage plating layer according to the present invention is made of a thin film, even in the case of a high-capacity high pin lead frame, the leads do not adhere to each other and the metal particles are much finely electrodeposited so that hydrogen embrittlement is almost impossible. It is possible to obtain a flexible plating layer having no microcracks and exhibits excellent adhesion, corrosion resistance and solderability. In addition, there are no problems such as silver discoloration and emission of pollutants caused by lead in the existing plating process.
机译:公开了一种在由铁-镍合金材料制成的半导体引线框架上进行钯电镀和钯合金电镀的方法。该方法包括在铁-镍合金材料的镀覆体上的铜镀层,镍锡合金镀层或铜锡合金镀层。其特征在于,形成一次基体,然后在二次基体上形成镍镀层,金合金镀层,然后再进行钯或钯合金镀覆,但一次基体镀层为铜镀层的情况除外。层,第二基础镀层是金合金镀层。由于根据本发明的三阶段镀层是由薄膜制成的,因此即使在高容量高引脚引线框架的情况下,引线也不会彼此粘附,并且金属微粒被细微地电沉积,因此氢脆几乎是不可能的。可以获得没有微裂纹并且显示出优异的粘附性,耐腐蚀性和可焊性的柔性镀层。另外,在现有的电镀工艺中,不存在银变色和铅引起的污染物排放等问题。

著录项

  • 公开/公告号KR100193188B1

    专利类型

  • 公开/公告日1999-06-15

    原文格式PDF

  • 申请/专利权人 문성수;

    申请/专利号KR19960021467

  • 发明设计人 문성수;

    申请日1996-06-14

  • 分类号C25D3/50;

  • 国家 KR

  • 入库时间 2022-08-22 02:16:01

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