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PROCESS OF MANUFACTURING UPHEAVAL TYPE LITHIUM NIOBATE OPTICAL WAVEGUIDE

机译:制造超短波型铌酸锂光学波导的过程

摘要

The present invention relates to a method for manufacturing a raised lithium niobate optical waveguide. More specifically, the present invention can obtain an etching result with high etching rate and uniformity even at room temperature by a simple process, and can obtain an optical waveguide having a stable refractive index and an electro-optic effect. It relates to a manufacturing method. A method of manufacturing a raised lithium niobate optical waveguide of the present invention includes forming a metal mask on a lithium niobate substrate and forming a proton exchange layer on the substrate by selective proton exchange; Etching the proton exchange layer by wet etching the substrate on which the proton exchange layer is formed with an etching solution; Depositing a proton exchange mask by coating a photoresist on the electrically etched substrate and irradiating light from the bottom of the substrate to selectively photoresist the photoresist and develop the photoresist; And removing the electrometal mask and the proton exchange mask on the metal mask to protonate and heat treat the substrate. According to the method of manufacturing the raised lithium niobate optical waveguide of the present invention, an etching result excellent in high etching rate and uniformity can be obtained even at room temperature by a simple process, and thus an optical waveguide can be manufactured economically in a short time.
机译:本发明涉及一种用于制造凸起的铌酸锂光波导的方法。更具体地,本发明甚至可以通过简单的工艺获得即使在室温下也具有高蚀刻速率和均匀性的蚀刻结果,并且可以获得具有稳定的折射率和电光效应的光波导。本发明涉及一种制造方法。本发明的凸起的铌酸锂光波导的制造方法,其特征在于,在铌酸锂基板上形成金属掩模,并通过选择性质子交换在基板上形成质子交换层。通过用蚀刻溶液对形成有质子交换层的基板进行湿式蚀刻来蚀刻质子交换层。通过在电蚀刻的衬底上涂覆光刻胶并从衬底的底部照射光以选择性地光刻胶并显影光刻胶,来沉积质子交换掩模。并去除金属掩模上的电金属掩模和质子交换掩模以对衬底进行质子化和热处理。根据本发明的凸起的铌酸锂光波导的制造方法,即使在室温下,也可以通过简单的工序获得高蚀刻速度和均匀性优异的蚀刻结果,因此可以廉价地制造光波导。短时间。

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