首页> 外国专利> EVANESCENT LIGHT ALIGNER, MASK USED IN THE SAME AND EVANESCENT LIGHT EXPOSING METHOD

EVANESCENT LIGHT ALIGNER, MASK USED IN THE SAME AND EVANESCENT LIGHT EXPOSING METHOD

机译:避光灯警报器,用于避光灯的相同和避光方法

摘要

PROBLEM TO BE SOLVED: To provide an evanescent light aligner capable of easily performing a batch exposure whose wavelength is equal to or less than that of light. ;SOLUTION: A cylinder 106 is connected to a pressure container 103 whose inside is filled with a refractive index adjusting liquid 105. The pressure of the liquid 105 inside the container 103 can be adjusted by driving the cylinder 106 through a piston driving motor 108. A glass window 114 for introducing a laser 112 which becomes parallel light by a collimator lens 113 after being emitted from a laser 111 is provided on the container 103. A substrate 102 is mounted on a stage 110 and resist 109 is applied on the surface of the substrate 102. An evanescent light mask 101 is constituted of an evanescent light mask base material 104 and an evanescent light mask metal pattern 115 and attached to the container 103 so that the surface 101a is opposed to the substrate 102 for being worked and the back surface 101b is brought into contact with the liquid 105.;COPYRIGHT: (C)1999,JPO
机译:解决的问题:提供一种an逝光对准器,其能够容易地进行波长等于或小于光的波长的批量曝光。 ;解决方案:气缸106连接到压力容器103,压力容器103的内部装有折射率调节液体105。可以通过活塞驱动马达108驱动气缸106来调节容器103内部的液体105的压力。在容器103上设置有玻璃窗114,该玻璃窗114用于引入激光器112,该激光器112在从激光器111发射之后由准直透镜113变为平行光。将基板102安装在台架110上,并且将抗蚀剂109施加在其表面上。 e逝光掩模101由an逝光掩模基材104和an逝光掩模金属图案115构成,并且附着到容器103,使得表面101a与被加工的衬底102和背面相对。使表面101b与液体105接触。版权所有:(C)1999,JPO

著录项

  • 公开/公告号JPH11184094A

    专利类型

  • 公开/公告日1999-07-09

    原文格式PDF

  • 申请/专利权人 CANON INC;

    申请/专利号JP19970355336

  • 申请日1997-12-24

  • 分类号G03F7/20;G03F1/14;H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-22 02:33:53

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