首页> 外国专利> Method and apparatus for treating a substrate substantially opaque to laser radiation or unable to transmit laser radiation without absorbing substantial amounts of it and substrate substantially opaque to laser and which does not transmit leisure light without absorbing substantial amounts of laser energy

Method and apparatus for treating a substrate substantially opaque to laser radiation or unable to transmit laser radiation without absorbing substantial amounts of it and substrate substantially opaque to laser and which does not transmit leisure light without absorbing substantial amounts of laser energy

机译:用于处理基本对激光辐射不透明或不能透射激光辐射而不吸收大量激光的基材的方法和设备以及对激光基本不透明并且在不吸收大量激光能量的情况下不能透射休闲光的基材

摘要

The present invention relates to a method of treating substrates for the purpose of reducing the population of contaminant organisms associated with them; particularly to treatment of foodstuffs, propagative materials and items intended for use in veterinary and medical applications. The method directs laser radiation at the substrate whereby the type and amount of laser radiation are selected such as to render organisms associated with the substrate inviable while leaving the desired properties of the substrate itself substantially unchanged. Apparatus suitable for treating a variety of substrates are disclosed, with a source of laser radiation (9, 28) and means (26, 27, 29) for handling the substrate (24). IMAGE
机译:本发明涉及一种处理底物的方法,目的是减少与底物有关的污染生物的数量。特别是用于兽医和医疗用途的食品,繁殖材料和物品的处理。该方法将激光辐射引导到衬底上,由此选择激光辐射的类型和数量,以使得与衬底相关的生物无法生存,同时使衬底本身的期望特性基本保持不变。公开了适用于处理各种基板的设备,其具有激光辐射源(9、28)和用于处理基板(24)的装置(26、27、29)。 <图像>

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