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Plasma jet CVD method of depositing diamond or diamond-like films
Plasma jet CVD method of depositing diamond or diamond-like films
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机译:等离子喷射化学气相沉积法沉积金刚石或类金刚石薄膜
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摘要
The invention relates to electronics and optical industry technology. Deposition of diamond and diamond-like films is performed in a plasma flux at atmospheric pressure at a temperature T=10.sup.4 ° K. A mixture of hydrocarbons and hydrogen is fed to a plasma flux formed by the confluence of a plurality of jets. As a result of the processes occurring in the plasma flux, there is deposited on the substrate a diamond or diamond-like film having a high degree of adhesion to the substrate, at a rate of 1 micron/sec, which substantially exceeds the rate of deposition of similar films by known methods.
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