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Plasma jet CVD method of depositing diamond or diamond-like films

机译:等离子喷射化学气相沉积法沉积金刚石或类金刚石薄膜

摘要

The invention relates to electronics and optical industry technology. Deposition of diamond and diamond-like films is performed in a plasma flux at atmospheric pressure at a temperature T=10.sup.4 ° K. A mixture of hydrocarbons and hydrogen is fed to a plasma flux formed by the confluence of a plurality of jets. As a result of the processes occurring in the plasma flux, there is deposited on the substrate a diamond or diamond-like film having a high degree of adhesion to the substrate, at a rate of 1 micron/sec, which substantially exceeds the rate of deposition of similar films by known methods.
机译:本发明涉及电子和光学工业技术。金刚石和类金刚石膜的沉积是在大气压下在温度T = 10×4°K的等离子体通量中进行的。将烃和氢的混合物供入由多个喷气机。由于等离子体通量中发生了这些过程,因此以1微米/秒的速率沉积在基板上的金刚石或类金刚石膜具有很高的与基板的附着力,该速率实质上超过了1微米/秒的速率。通过已知方法沉积类似的膜。

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