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Pollution measurement system of ion implanter and method of pollution measurement
Pollution measurement system of ion implanter and method of pollution measurement
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机译：离子注入机的污染测量系统及污染测量方法
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摘要
The present invention relates to an ion implantation apparatus during the manufacturing process of a semiconductor device, and more particularly, to a contamination measurement system and a contamination measurement method of an ion implanter for continuously measuring the degree of contamination in an ion implantation apparatus.;Conventionally, the particle measurement method consumes bare wafers every time a particle is tested. Since the ongoing process must be stopped during the measurement, loss of the operation efficiency of the equipment and economic loss are caused. As a result, There was a problem of deteriorating.;In order to overcome the above-described problems, the present invention provides a sensor for detecting particles in the process chamber of the ion implanter, and outputs the detected particles through output means, thereby managing particles at the same time as the process progresses, By managing the particles, it is possible to improve the efficiency of the equipment operation and to improve the yield and the quality of the product.
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