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Shape simulation device using Monte Carlo method and its method
Shape simulation device using Monte Carlo method and its method
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机译：使用蒙特卡洛方法的形状模拟装置及其方法
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摘要
A bulk plasma analysis section for performing analysis on the bulk plasma region and calculating the time variation of the potential in the plasma, the density of the particles, and the sheath length when the RF bias is applied; And a type of reaction between incident particles and adsorption species determined by the sheath plasma analysis section is determined by determining the adsorption species on the surface of the pitching material, There is provided a shape simulation apparatus comprising a surface reaction calculation unit and shape calculation means for calculating the shape of the material to be etched according to the kind of reaction determined by the surface reaction calculation unit.;Representative figure: 1st figure
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