首页> 外国专利> PROCESS FOR MANUFACTURING AND CALIBRATING A RULER IN THE NANOMETRE RANGE FOR TECHNICAL APPARATUSES THAT ARE USED FOR HIGH-RESOLUTION OF ULTRA-HIGH RESOLUTION IMAGING OF STRUCTURES

PROCESS FOR MANUFACTURING AND CALIBRATING A RULER IN THE NANOMETRE RANGE FOR TECHNICAL APPARATUSES THAT ARE USED FOR HIGH-RESOLUTION OF ULTRA-HIGH RESOLUTION IMAGING OF STRUCTURES

机译:在纳米技术范围内制造和校准标尺的过程,该标尺用于高分辨率的结构超高分辨率成像

摘要

1.1 A Process for Manufacturing and Calibrating a Rulerin the Nanometre Range for Technical Apparatusesthat are Used for High-resolution or Ultra-highResolution2.1 The present invention describes the production andcalibration of a ruler used to calibrate the abovestated technical apparatuses.2.2 At least two different crystalline or amorphousmaterials are used to construct the ruler; theseshould differ appropriately from each are in theircontrast during imaging. These layers of materialare deposited as a sequence of heterolayers on acarrier material, using a suitable materialdeposition process. The heterolayer sequence that isproduced is described experimentally with at leastone analytical method that is sensitive to theindividual layer thicknesses of the heterolayersequence. The data obtained by the analytical methodare evaluated and recorded. By separating theheterolayer sequence in the direction of deposition,it is possible to render the layer structurevisible.2.3 The solution according to the present invention issuitable, in particular, for calibrating technicalapparatuses that are used in raster electronmicroscopy, transmission electron microscopy, orraster probe microscopy (raster power microscopy,raster tunnel microscopy.3.0 Figure 1.
机译:1.1标尺的制造和校准过程在技​​术仪器的纳米范围内用于高分辨率或超高解析度2.1本发明描述了生产和标尺用于标定以上内容所述技术设备。2.2至少两种不同的结晶或无定形材料用于构造标尺;这些应该各有不同成像过程中的对比度。这些材料层作为异质层序列沉积在载体材料,使用合适的材料沉积过程。杂层序列是至少用实验描述了对分析敏感的一种分析方法杂层的各个层厚度顺序。通过分析方法获得的数据被评估和记录。通过分离沉积方向上的杂层序列,可以渲染图层结构可见。2.3根据本发明的解决方案是特别适合于技术校准光栅电子中使用的仪器显微镜,透射电子显微镜或光栅探针显微镜(光栅功率显微镜,光栅隧道显微镜。3.0图1。

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