首页> 外国专利> Device for generating a plasma in low pressure container e.g. for hardware items surface treatment by plasma etching and plasma deposition

Device for generating a plasma in low pressure container e.g. for hardware items surface treatment by plasma etching and plasma deposition

机译：在低压容器中产生等离子体的装置，例如通过等离子蚀刻和等离子沉积对五金件进行表面处理

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摘要

The device uses alternating electromagnetic fields; a rod-shaped conductor (5) inside a tube of insulating material is fed through the low pressure container. The internal dia. of the tube is greater than the dia. of the conductor. The tube is held at both ends by walls of the container and is sealed wrt. the walls at its outer surface. The conductor is connected at both ends to sources (6,7) for generating the electromagnetic fields, which are microwaves. The sources are both generators whose output powers are mutually independently controllable. The generators are operated in pulsed manner whereby only one is generating the alternating field alternately.

机译：该设备使用交变电磁场;绝缘材料管内的杆状导体（5）穿过低压容器。内部直径管的直径大于直径。导体。该管的两端被容器的壁保持并被密封。在其外表面的墙壁。导体的两端均连接到源（6,7），以产生电磁场，即微波。源都是发电机，其输出功率可以相互独立地控制。发电机以脉冲方式操作，从而只有一个发电机交替产生交变场。

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公开/公告号DE19503205C1

专利类型
公开/公告日1996-07-11

原文格式PDF
申请/专利权人 MUEGGE ELECTRONIC GMBH 64385 REICHELSHEIM DE;
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申请/专利号DE1995103205
发明设计人 RAEUCHLE EBERHARD DIPL.-PHYS. DR.-ING. 71686 REMSECK DE;RAEUCHLE FRITZ KONSTANTIN 71686 REMSECK DE;PETASCH WOLFGANG DIPL.-PHYS. 71691 FREIBERG DE;MUEGGE HORST 64385 REICHELSHEIM DE;
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申请日1995-02-02
分类号H05H1/46;H01J37/32;
国家 DE
入库时间 2022-08-22 03:43:39

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