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A method of depositing a thin layer on a substrate using a remote cooling nitrogen plasma (Method for thin film deposition on a substrate using a remote cold nitrogen plasma)
A method of depositing a thin layer on a substrate using a remote cooling nitrogen plasma (Method for thin film deposition on a substrate using a remote cold nitrogen plasma)
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机译：使用远程冷却氮等离子体在基板上沉积薄层的方法（使用远程冷氮等离子体在基板上沉积薄膜的方法）
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摘要
In a method of applying a thin layer to a metal, organic or inorganic substrate 12, a remote cooling nitrogen plasma, essentially consisting of glass nitrogen atoms, is generated in the vessel 5 in which the substrate 12 is located.;In order to form the protective layer, a gaseous organosilicon compound or organic germanium compound containing CH, Si (or Ge), O or NH groups is introduced into the vessel 5 during the formation of the remote nitrogen plasma. In order to form a thin dielectric layer, an organometallic compound may be further added.
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