Aluminum oxide low pressure chemical vapor deposition (LPCVD) system- fourier transform infrared (FTIR) source chemical control

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  机译： 氧化铝低压化学气相沉积（LPCVD）系统-傅立叶变换红外（FTIR）源化学控制方法

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  机译： FTIR低压化学气相沉积法（LPCVD）的控制面

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  机译： 使用低压化学气相沉积（LPCVD）形成用于半导体器件的氧化硅层的方法

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