首页> 外国专利> METHOD OF CONTROLLING POLARIZATION PROPERTIES OF A PHOTO-INDUCED DEVICE IN AN OPTICAL WAVEGUIDE AND METHOD OF INVESTIGATING STRUCTURE OF AN OPTICAL WAVEGUIDE

METHOD OF CONTROLLING POLARIZATION PROPERTIES OF A PHOTO-INDUCED DEVICE IN AN OPTICAL WAVEGUIDE AND METHOD OF INVESTIGATING STRUCTURE OF AN OPTICAL WAVEGUIDE

机译:控制光波导中的光诱导装置的偏振特性的方法和光波导的结构研究方法

摘要

A method of controlling the polarization properties of a photo-induced device in an optical waveguide and a method of investigating the structure of a light guiding body such as an optical waveguide are disclosed. A device, such as gratings, is written by exposing one side of the optical waveguide to light. The unexposed side is then exposed to an amount of light sufficient to impart the desired birefringence to the written device. The birefringence can be minimized in the written device by exposing the opposite side to light in an amount sufficient to minimize the amount of birefringence. The light guiding body is investigated by cleaving the elongated light guiding body, such as an optical waveguide, to expose its cross-section. The cleaved section is then treated to expose difference between the core and cladding. Treatment may include etching in an acid or base. The cross-section is then profiled with a scanning probe microscope such as an atomic force microscope to investigate the structure of the light guiding body. The difference in refractive index can be determined across the cleaved endface based on differences in the etched depth.
机译:公开了一种控制光波导中的光致器件的偏振特性的方法以及研究诸如光波导的光导体的结构的方法。通过将光波导的一侧暴露于光来写入诸如光栅之类的设备。然后使未曝光的一面暴露于足以向书写装置赋予所需双折射的光量。通过使相对侧暴露于足以使双折射量最小化的量的光中,可以在书写设备中使双折射最小化。通过劈开诸如光波导之类的细长的导光体以暴露其横截面来研究导光体。然后对开裂的部分进行处理,以露出纤芯和包层之间的差异。处理可以包括在酸或碱中蚀刻。然后用诸如原子力显微镜的扫描探针显微镜对横截面进行轮廓分析,以研究导光体的结构。可以基于蚀刻深度的差异来确定在切割后的端面上的折射率差异。

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