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CLEANING SOLUTION FOR SENSITIZING AGENT PRODUCTION DEVICE, CLEANING METHOD USING THE SAME, CLEANING SOLUTION FOR RESIST SOLUTION PREPARATION DEVICE AND CLEANING METHOD USING THE SAME SOLUTION
CLEANING SOLUTION FOR SENSITIZING AGENT PRODUCTION DEVICE, CLEANING METHOD USING THE SAME, CLEANING SOLUTION FOR RESIST SOLUTION PREPARATION DEVICE AND CLEANING METHOD USING THE SAME SOLUTION
PURPOSE: To obtain a cleaning solution having excellent cleaning efficiency for a production device for a quinonediazide-based sensitizing agent and a preparation device for a positive type resist solution and to provide a cleaning method. ;CONSTITUTION: A cleaning solution contains N-methylpyrrolidone as a main component, and preferably further contains at least one organic solvent selected from the group consisting of dichloromethane, cyclopentanone and acetone, and more preferably contains at least one selected from the group consisting of dichloromethane, cyclopentanone, ethyl lactate, 2-heptanone, γ-butyrolactone, propyleneglycol-monoethyletheracetate, ethylcellosolve acetate and acetone. A production device for sensitizing agent is effectively cleaned by using this cleaning solution.;COPYRIGHT: (C)1995,JPO
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