首页> 外国专利> Apparatus for measuring a diffraction pattern of electron beams having only elastic scattering electrons

Apparatus for measuring a diffraction pattern of electron beams having only elastic scattering electrons

机译:用于测量仅具有弹性散射电子的电子束的衍射图样的设备

摘要

An electron beam emitted from an electron gun is applied to an object whose crystal structure is being examined in a vacuum, and electron beams diffracted by the object are introduced into an energy discriminator of an energy analyzer which discriminates an electron beam or beams having a predetermined energy. The thus discriminated electron beams is converted by an electron beam detector into an electric signal for measuring the diffracted electron beam intensity.
机译:从电子枪发射的电子束被施加到在真空中检查其晶体结构的物体,并且由该物体衍射的电子束被引入到能量分析器的能量鉴别器中,该能量鉴别器辨别具有预定的电子束或多个电子束。能源。如此区分的电子束通过电子束检测器转换为用于测量衍射电子束强度的电信号。

著录项

  • 公开/公告号US5336886A

    专利类型

  • 公开/公告日1994-08-09

    原文格式PDF

  • 申请/专利权人 JAPAN AVIATION ELECTRONICS INDUSTRY LIMITED;

    申请/专利号US19930048244

  • 发明设计人 KAZUHIKO ITOH;

    申请日1993-04-19

  • 分类号H01J37/295;

  • 国家 US

  • 入库时间 2022-08-22 04:31:20

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号