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Selective precipitation of aluminium structures from the gas phase - using locally applied thin aluminium@ layers as catalysts in the pptn. process
Selective precipitation of aluminium structures from the gas phase - using locally applied thin aluminium@ layers as catalysts in the pptn. process
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机译：从气相中选择性沉淀铝结构-使用局部涂覆的薄铝层作为pptn中的催化剂。处理
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摘要
Method comprises a) applying aluminium locally as thin layers onto a substrate; and b) precipitating aluminium from the gas phase selectively onto the caalytically acting layers until a desired height of the structure has been attained. The thin selective aluminium layers - prior to the second process step - are pref. either protected against oxidn. caused by air, or subjected to oxidn.. Selective application of thin aluminium layers in the first process step takes place as laser-aided coating from the gas phase, as thermal vaporisation with the use of masks, or as metallisation. USE/ADVANTAGE - For manufacture of semiconductor components and products. It simplifies the manufacturing process, and eliminates the need for palladium, platinum or gold as catalyst materials.
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