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ELECTROPLATING BATH USING ORGANIC SOLVENT FOR PLATING PERMANENT MAGNET OF R 2?T 14?B INTERMETALLIC COMPOUND.
ELECTROPLATING BATH USING ORGANIC SOLVENT FOR PLATING PERMANENT MAGNET OF R 2?T 14?B INTERMETALLIC COMPOUND.
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机译:使用有机溶剂电镀R 2?T 14?B中间化合物的永磁体的电镀浴。
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摘要
An electroplating bath using an organic solvent for plating a permanent magnet material comprising an R₂T₁₄B intermetallic compound (wherein R represents a rare earth element including yttrium and T represents a transition metal), wherein the support salt comprises at least one member selected from the group consisting of: (1) boric compounds including at least one of R'₃BO₃ (wherein R' represents hydrogen or alkyl), MBO₂ (wherein M represents hydrogen or alkali metal), M'BO₃ (wherein M' represents alkali metal), and M'₂BxO(3x+2)/2 (wherein x is an even number of 2 or above); (2) XO₄- salts of alkali metal or tetraalkylammonium, including at least either M'XO₄ or R'₄NXO₄ (wherein X represents halogen); (3) BX₄-salts of alkali metal or tetraalkylammonium, including at least either M'BX₄ or R'₄NBX₄; (4) PX₆- salts of alkali metal or tetraalkylammonium, including at least either M'PX₆ or R'₄NPX₆; (5) CX₃SO₃- salts of alkali metal or tetraalkylammonium, including at least either M'CX₃SO₃ or R'₄NCX₃SO₃; and (6) R'COO- salts of alkali metal, including R'COOM'.
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机译:一种使用有机溶剂电镀永磁体的电镀浴,该永磁体材料包括R 2T₁₄B金属间化合物(其中R代表包括钇的稀土元素,T代表过渡金属),其中支持盐包括至少一种选自以下的元素: (1)硼化合物,其至少包含以下一种:R'₃BO₃(其中R'代表氢或烷基),MBO_2(其中M代表氢或碱金属),M'BO₃(其中M'代表碱金属)和M '2 BxO(3x + 2)/ 2(其中x是2的偶数或更大); (2)XO 3-碱金属或四烷基铵的盐,至少包括M'XO 3或R'₄NXO3(其中X代表卤素); (3)碱金属或四烷基铵的BX 3盐,至少包括M'BX 3或R'₄NBX3; (4)碱金属或四烷基铵的PX 3-盐,至少包括M'PX 3或R'₄NPX3; (5)碱金属或四烷基铵的CX 3 SO 4盐,至少包括M'CX 3 SO 4或R'3 NCX 3 SO 4; (6)碱金属的R'COO-盐,包括R'COOM'。
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