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Microwave plasma producing device used in plasma etching - has microwave coupled to circular dielectric plate via its side to enable uniform production of electric field in discharge chamber leading to uniform plasma distribution
Microwave plasma producing device used in plasma etching - has microwave coupled to circular dielectric plate via its side to enable uniform production of electric field in discharge chamber leading to uniform plasma distribution
Microwave plasma producing device consists of a microwave conducting channel (111) which surrounds a circular dielectric plate (116) located on top of a discharge chamber (121) which houses the workpiece (120) as the microwave passes along the channel (111) it becomes coupled to the plate via the latter's side (115) and produces an electric field (E) in the discharge chamber (121) which in turn produces the plasma as gases are passed through (123,122). ADVANTAGE - Used in plasma etching and chemical vaporisation technique. By ensuring a uniformly produced electric field over the whole surface of the plate a uniformly dispersed plasma is created in the chamber (121). This enables the uniform working of large area workpieces.
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