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USE OF HEXATRIENE DERIVATIVES FOR THE MANUFACTURE OF PREPARATIONS FOR TREATING ACNE, PSORIASIS AND LIGHT-INDUCED DAMAGE TO THE SKIN

机译：使用己三烯衍生物制造治疗痤疮，牛皮癣和光致皮肤损伤的制剂

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摘要

Use of hexatriene derivatives of formula (I), where R1 has the meaning given in the description, for the manufacture of pharmaceutical and cosmetic preparations for treating acne, psoriasis and other dermatological diseases accompanied by pathological cornification and for treating iatrogenic skin damage or skin damage caused by the action of UV light, eczema, warts, vitiligo, dry eyes and other corneopathies, as well as precanceroses and tumours, rheumatic and arthritic diseases.

机译：式（I）的己三烯衍生物的用途，其中R1具有说明书中给出的含义，用于制备药物和化妆品制剂，用于治疗痤疮，牛皮癣和其他伴有病理性角质的皮肤病，以及用于治疗医源性皮肤损伤或皮肤损伤由紫外线，湿疹，疣，白癜风，干眼症和其他角膜病，以及前玫瑰和肿瘤，风湿病和关节炎疾病引起的。

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公开/公告号JPH04501847A

专利类型
公开/公告日1992-04-02

原文格式PDF
申请/专利权人
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申请/专利号JP19890502442
发明设计人
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申请日1989-02-02
分类号A61K31/075;A61K31/015;A61K31/07;A61K31/135;A61K31/165;A61K31/19;A61K31/215;A61K31/22;A61K31/275;A61K31/40;A61K31/42;A61K31/421;A61P17/00;A61P27/02;A61P29/00;A61P31/04;A61P35/00;C07C403/00;C07C403/06;C07C403/14;C07C403/18;C07C403/20;C07D257/04;C07D263/12;C07D295/02;C07D317/12;
国家 JP
入库时间 2022-08-22 05:39:47

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