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Process and apparatus for producing epitaxial and/or highly textured grown film, free of foreign phases, of a high-T.sub.c -oxide superconductor on a substrate
Process and apparatus for producing epitaxial and/or highly textured grown film, free of foreign phases, of a high-T.sub.c -oxide superconductor on a substrate
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机译：用于在基板上生产无异相的高Tc氧化物超导体的外延和/或高织构生长薄膜的方法和设备
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摘要
A process for producing an epitaxial and/or highly texturized grown film, free of foreign phases, of a high-T.sub.c -oxide superconductor on a substrate, in which an ablation process is triggered and maintained on a spender target by means of pulsed particles or a laser beams, and the thus developing small droplets are deposited on a heated substrate. The substrate is held at a temperature at which the droplets on impact wet the substrate and coagulate into a uniform smooth film.PP An apparatus for this process comprises an electron source which produces a pulsed electron beam with an electron energy of about 10 to 20 keV and a current density in the range of 10.sup. 3 to 10.sup.4 A/cm.sup.2.
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