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Apparatus for analysis by ellipsometry, procedure for ellipsometric analysis of a sample and application to the measurement of variations in the thickness of thin films

机译:椭圆偏光分析仪,椭圆偏光分析程序及用于测量薄膜厚度变化

摘要

An apparatus for analysis of samples (E) by ellipsometry, and an analysis procedure. The light beam (F) passes through a polarizer (4), a rotating (omega) doubly refracting plate (5) and an analyzer (6). The measurement uses the second and fourth harmonics of the speed of rotation of the plate (5). Application in particular to the growth and etching of thin films.
机译:一种用于通过椭圆偏振分析样品(E)的设备以及分析程序。光束(F)穿过偏振器(4),旋转的(ω)双折射板(5)和检偏器(6)。该测量使用板(5)的旋转速度的二次谐波和三次谐波。特别应用于薄膜的生长和蚀刻。

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