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Apparatus for analysis by ellipsometry, procedure for ellipsometric analysis of a sample and application to the measurement of variations in the thickness of thin films
Apparatus for analysis by ellipsometry, procedure for ellipsometric analysis of a sample and application to the measurement of variations in the thickness of thin films
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机译:椭圆偏光分析仪,椭圆偏光分析程序及用于测量薄膜厚度变化
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摘要
An apparatus for analysis of samples (E) by ellipsometry, and an analysis procedure. The light beam (F) passes through a polarizer (4), a rotating (omega) doubly refracting plate (5) and an analyzer (6). The measurement uses the second and fourth harmonics of the speed of rotation of the plate (5). Application in particular to the growth and etching of thin films.
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