首页> 外国专利> REACTIVE AIR PERMEATION RESISTANT POLYMER FOR PRODUCTION OF ELECTRODE SUBSTRATE FOR LIQUID CRYSTAL DISPLAY PANEL AND ELECTRODE SUBSTRATE FOR LIQUID CRYSTAL DISPLAY PANEL USING THE SAME

REACTIVE AIR PERMEATION RESISTANT POLYMER FOR PRODUCTION OF ELECTRODE SUBSTRATE FOR LIQUID CRYSTAL DISPLAY PANEL AND ELECTRODE SUBSTRATE FOR LIQUID CRYSTAL DISPLAY PANEL USING THE SAME

机译:用于生产液晶显示面板用电极基质的抗空气渗透性聚合物和使用相同的生产液晶显示器用电极基质的抗空气渗透性聚合物

摘要

PURPOSE:To maintain stable performance over a long period of time even under severe use conditions by using the reactive air permeation resistant polymer formed by polymerizing a monomer mixture consisting of a specific ethylenic unsatd. amide monomer and a vinyl polymerizable monomer in the copresence of a vinyl alcohol polymer as a substrate material. CONSTITUTION:The monomer mixture (M) consisting of the ethylenic unsatd. amide monomer (Ma) expressed by formula I and the vinyl polymerizable monomer (Mb) having a carboxyl group in the molecule is polymerized in the copresence of the vinyl alcohol polymer (V) to obtain the reactive air permeation resistant polymer. In formula I, R1, R2 are H or lower alkyl group; R3 is 1 to 4C alkylene group. The molar ratio of (Ma)/(Mb) or this reactive air permeation resistant polymer (Ma)/(Mb) is 0.05 to 5.0 and the weight ratio of (M)/(V) is 0.02 to 0.5. The layer 2 consisting of such reactive air permeation resistant polymer is provided on one or both surfaces of a base material layer consisting of a non-optically active transparent film or sheet having =80nm retardation value, by which the electrode substrate is formed.
机译:目的:通过使用由特定的未饱和烯键组成的单体混合物聚合而成的反应性抗空气渗透性聚合物,即使在苛刻的使用条件下也能在长时间内保持稳定的性能。在乙烯醇聚合物作为基材的同时存在的情况下,酰胺单体和乙烯基可聚合单体。组成:单体混合物(M),由不饱和的烯键组成。在乙烯醇聚合物(V)的共存下,使由式I表示的酰胺单体(Ma)和在分子中具有羧基的乙烯基可聚合单体(Mb)发生聚合,从而得到耐反应性透气性聚合物。式I中,R 1,R 2为H或低级烷基。 R 3为1〜4C亚烷基。 (Ma)/(Mb)或该反应性耐透气性聚合物(Ma)/(Mb)的摩尔比为0.05〜5.0,(M)/(V)的重量比为0.02〜0.5。在由具有<= 80nm的相位差值的非光学活性的透明膜或片构成的基材层的一个或两个表面上,设置有由这样的耐反应性透气性聚合物构成的层2,由此形成电极基板。

著录项

  • 公开/公告号JPH0268519A

    专利类型

  • 公开/公告日1990-03-08

    原文格式PDF

  • 申请/专利权人 FUJIMORI KOGYO KK;TEIKOKU CHEM IND CORP LTD;

    申请/专利号JP19880220643

  • 发明设计人 ICHIKAWA RINJIRO;SAKASHITA YOSHIAKI;

    申请日1988-09-02

  • 分类号G02F1/13;C08F2/44;C08F20/52;C08F220/04;C08F220/58;C08L29/04;C08L33/04;C08L33/26;G02F1/1333;G02F1/1343;

  • 国家 JP

  • 入库时间 2022-08-22 06:20:47

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号