首页> 外国专利> Optical system including etalon for optically processing electromagnetic radiation at a repetition rate greater than about 1. 25amp;times;10.sup.4 Hz

Optical system including etalon for optically processing electromagnetic radiation at a repetition rate greater than about 1. 25amp;times;10.sup.4 Hz

机译:包括标准具的光学系统,用于以大于约1的重复速率对电磁辐射进行光学处理。25×10 4赫兹

摘要

An optical system is disclosed which includes at least a first source of electromagnetic radiation (signal beam radiation), a device for processing the signal beam radiation, and a detector for detecting the processed signal beam radiation. The processing device functions, for example, as an amplitude modulator, a demultiplexer, or a switch, and includes a material region exhibiting a nonlinear optical response at one or more resonant wavelengths of electromagnetic radiation, as well as at least a second source of electromagnetic radiation (control beam radiation) for selectively inducing the nonlinear optical response. Significantly, the wavelength, duration and intensity of the control beam radiation are chosen to induce a resonant, nonlinear optical response, essentially free of any relatively slow component, in said material region at repetition rates higher than about 1.25×10.sup.4 Hz, or higher than about 3.3×10.sup.10 Hz, or even as high, or higher, than about 2.5×10.sup.11 Hz.
机译:公开了一种光学系统,该光学系统至少包括第一电磁辐射源(信号束辐射),用于处理信号束辐射的装置以及用于检测处理后的信号束辐射的检测器。该处理装置例如用作幅度调制器,解复用器或开关,并且包括材料区域,该材料区域在一个或多个电磁辐射的谐振波长处表现出非线性光学响应,以及至少第二电磁源。辐射(控制束辐射)用于选择性地诱导非线性光学响应。明显地,选择控制束辐射的波长,持续时间和强度以在所述材料区域中以高于大约1.25×10 4赫兹的重复率引发共振非线性光学响应,该响应基本上没有任何相对慢的分量。 ,或者高于或高于约3.3×10×10 Hz,或者甚至高于或高于约2.5×10×11 Hz。

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