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Device and method for providing optical bistability with free carrier recombination centers introduced into an optical guide surrounding semiconductor layer portion

机译:用于通过引入围绕半导体层部分的光导的自由载流子复合中心来提供双稳态的装置和方法

摘要

In a semiconductor layer which has in a semiconductor bistable etalon a refractive index variable, as a result of absorption by excitons, with the intensity of an optical beam incident thereon, an optical guide for the optical beam is surrounded by a cladding portion including atoms which reduce the refractive index in the cladding portion relative to the optical guide and serve as recombination centers for free carries produced by decomposition of the excitons. The semiconductor layer may be either a superlattice layer, such as a GaAs-GaAlAs layer, or a bulk semiconductor layer, such as a GaAs layer. After forming the semiconductor layer on an etch-stop layer which is formed on a semiconductor substrate for chemical etch of the substrate for a window, the atoms are injected into the surrounding portion as by bombarding an exposed surface of the semiconductor layer by hydrogen ions with a mask selectively formed on the exposed area to cover an area contiguous on the exposed surface to a columnar portion which becomes the optical guide. The hydrogen ions automatically become the atoms of the above-described type in the surrounding portion.
机译:在具有双稳态标准具的半导体层中,由于激子吸收,折射率随入射光束的强度而变化,该光束的光导被包含原子的包层包围。降低包层部分相对于光导的折射率,并用作由激子分解产生的自由载流子的复合中心。半导体层可以是超晶格层,例如GaAs-GaAlAs层,或者可以是体半导体层,例如GaAs层。在形成在用于对窗用基板进行化学蚀刻的半导体基板上的蚀刻停止层上形成半导体层之后,通过用氢离子轰击半导体层的暴露表面,将原子注入到周围部分中。掩模选择性地形成在暴露区域上,以覆盖暴露表面上与成为光导的柱状部分连续的区域。氢离子在周围部分自动成为上述类型的原子。

著录项

  • 公开/公告号US4795241A

    专利类型

  • 公开/公告日1989-01-03

    原文格式PDF

  • 申请/专利权人 NEC CORPORATION;

    申请/专利号US19870125083

  • 发明设计人 MASAHIKO FUJIWARA;KEIRO KOMATSU;

    申请日1987-11-25

  • 分类号G02B5/23;

  • 国家 US

  • 入库时间 2022-08-22 06:28:42

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