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METHOD FOR CHROMELEKTROPLETTERING USING an equilibrated aqueous solution of a CHROMIUM (III) -THIOCYANATKOMPLEKS AS chromium source AND CHROMELEKTROPLETTERINGSOPLOESNING SUITABLE FOR USE IN PROCEDURE
METHOD FOR CHROMELEKTROPLETTERING USING an equilibrated aqueous solution of a CHROMIUM (III) -THIOCYANATKOMPLEKS AS chromium source AND CHROMELEKTROPLETTERINGSOPLOESNING SUITABLE FOR USE IN PROCEDURE
A very low concentration (below 0.03 M) trivalent chromium plating bath in which the source of chromium is an equilibrated aqueous solution of a chromium (III) - thiocyanate complex gives a deposit of unexpectedly light color. Such a bath is employed to produce thin overcoatings of light colored chromium for decorative applications. The bath and process is also used to plate the initial layer of a thick (greater than 5 micron) deposit for engineering applications, the major part of which is plated from a higher chromium concentration bath. Such thick deposits from a higher concentration bath are more cohesive and smoother when plated over an initial layer from the low concentration bath.
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