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Method of making junction isolated bipolar device in unisolated IGFET IC
Method of making junction isolated bipolar device in unisolated IGFET IC
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机译:在非隔离型IGFET IC中制作结隔离型双极型器件的方法
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摘要
A bipolar device is formed in an N epitaxial layer region isolated from an N substrate and the remainder of the N epitaxial layer by a P surface ring and a buried P region. An N channel device is formed in the P surface ring and a P channel device is formed in the N epitaxial layer. A buried N region is formed in the buried P region using the same mask used to form the buried P region.
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