process for the manufacture of a halfgeleiderinrichting, taking on a surface of a halfgeleiderlichaam against funding and thermal oxidation masking mask is applied.the windows in the mask released parts of the surface are subject to a etsbehandeling for forms of floors and the halfgeleiderlichaam with the mask is the warejected a thermal oxydatiebehandeling to form a oxydepatroon that at least partially fills the floors.