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process for the production of gallium arsenide essentially far as galliumschmelze for use as source material in the gas phase epitaxie

机译:基本上与砷化镓用作气相外延材料的砷化镓的生产方法

摘要

Prepn. of Ga melt satd. with GaAs by passing over molten Ga a mixt. of AsCl3 and H2 is improved by reducing the AsCl3 feed rate as soon as a GaAs crust, which is formed on the Ga melt, reaches such a thickness that the diffusion of As into the inner of the Ga melt is hindered; the feeding of AsCl3 is resumed when the GaAs crust partly dissolves in the melt so that As can again diffuse into Ga. This cycle is repeated until saturation of the melt with GaAs is reached. By this method, excessive development of the GaAs crust (which is undesirable for the gas phase epitaxy) is prevented, and saturation of Ga melt with As is accelerated.
机译:准备的Ga熔体饱和。与GaAs混合通过熔融的Ga。一旦在Ga熔体上形成的GaAs结壳达到这样的厚度,即阻止了As向Ga熔体内部的扩散,就可以通过降低AsCl3的进料速度来改善AsCl3和H2的含量。当GaAs壳部分溶解在熔体中时,As可以再次扩散到Ga中,AsCl3的供给得以恢复。重复此循环,直到熔体被GaAs饱和。通过这种方法,防止了GaAs结皮的过度发展(这对于气相外延而言是不希望的),并且加速了Ga熔体被As饱和。

著录项

  • 公开/公告号DE000002326803A

    专利类型

  • 公开/公告日1974-12-19

    原文格式PDF

  • 申请/专利权人 SIEMENS AG;

    申请/专利号DE2326803A

  • 申请日1973-05-25

  • 分类号B01J17/32;

  • 国家 DE

  • 入库时间 2022-08-23 04:06:04

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