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Optical correction configurations, projection objectives with such optical correction configurations, and microlithography equipment with such projection objectives.
Optical correction configurations, projection objectives with such optical correction configurations, and microlithography equipment with such projection objectives.
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机译：光学校正配置，具有这种光学校正配置的投影目标，以及具有这种投影目标的微光学设备。
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摘要
An optical correction arrangement includes a first and a second correction component arranged in succession along an optical axis. The first and the second correction components are provided with aspherical surface contours which at least approximately add up to zero overall in a zero position of the optical correction arrangement. The optical correction arrangement also includes a manipulator for displacing the first correction component in a first direction at a first speed and for displacing the second correction component in a second direction at a second speed. The first speed is greater than the second speed.
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