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How to Construct Optical Layers in Imprint Lithography Processes

机译：如何在压印光刻过程中构建光学层

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摘要

The imprint lithography method of configuring an optical layer includes imprinting first features of a first size with a patterning template on a side of a substrate, and at the same time, imprinting first features of a second size with a patterning template on the side of a substrate. Imprinting two features, the second features being sized and arranged to define a gap between the adjacent surface and the substrate.

机译：配置光层的压印光刻方法包括在衬底的一侧上用图案化模板压印第一尺寸的第一特征，同时在侧面上用图案化模板压印第二尺寸的第一特征。基质。印刷两个特征，第二特征尺寸和布置成在相邻的表面和基板之间定义间隙。

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公开/公告号KR102231664B1

专利类型
公开/公告日2021-03-23

原文格式PDF
申请/专利权人
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申请/专利号KR1020197019075
发明设计人 싱 비크람지트;밀러 마이클 네빈;쑤 프랑크 와이.;
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申请日2017-09-14
分类号G03F7;B29C33/42;B29C59/02;
国家 KR
入库时间 2022-08-24 17:51:21

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